45nm Bulk CMOS
Advanced Technology Made Affordable
AS045BK is a 45nm bulk CMOS foundry process available for commercial, military, and aerospace applications. What makes AS045BK different is that it was built from the ground up to be economically viable, especially for R&D and low volume production.
AS045BK utilizes Mask-Lite™ technology to drastically reduce reticle costs, delivering up to a 90% cost reduction. Mask-Lite leverages 1D/grated design methodologies to simplify layout rules. The simplified masks require little or no corrections such as OPC and are easier to fabricate than standard 2D layouts. Additionally, AS045BK is available with Multi-Layer Reticles (MLR) to further reduce mask costs.
AS045BK also reduces cost through simplified design rules and with support from low cost design tools. The same factors that drive high mask costs in standard 2D layouts drive complex design rules for those processes, with design rules consuming hundreds of pages. AS045BK rules have been simplified such that designers can design and tapeout rather than read volumes of rules and spend weeks running through DRCs. Additionally, the simplified rules allow designers to work with lower cost tools that can potentially save hundreds of thousands of dollars in project cost.
AS045BK is available for early product design engagements as well as consideration of custom process requirements and/or technology development.
Up to 90% reduction in mask costs using Mask-Lite™
Simplified design rules
Supports low cost design tools
Economically feasible for R&D and low volume production
Up to 9 layers of Copper interconnect
AS045BK is being developed with support from Air Force Research Laboratory.